Pure Metal Sputtering Targets
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Pure Metal Sputtering Targets are quite common in modern industry. They are the most widely used and fundamental coating materials for other sputter deposition technology.Metal sputtering target is demanded to be as superficially smooth as possible under the numerical control process. For example, the metallic film coated by sputtering methods should reflect at least 80% laser so that the compression molding disc can be read out by the player with enough signal intensity.

Please see our main Pure Metal Sputtering Target materials in below chart.

Materials

Purity

Ag

3N5-5N

Au

4N-5N

Cr

2N5-3N5

Hf

3N-4N

Mg

3N5-4N

Mo

3N5-4N

Nb

3N5-4N5

Ni

2N5-4N5

Pd

3N5

Pt

3N5-4N

Ru

3N5

Ta

3N5-4N

Ti

2N5-5N

Zr

2N5-3N5



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